Method and apparatus for producing nanoparticles at a high rate

A nanoparticle production system capable of producing nanoparticles at a rate of kilograms per hour, said system comprising:

• a first chamber;
• a first crucible within said first chamber for holding a first source material;
• a second crucible within said first chamber for holding a second source material;
• a first vacuum system coupled to said first chamber for evacuating said first chamber to a first pressure;
• an electron beam gun coupled to said first chamber for producing an electron beam, wherein said electron beam gun is maintained at approximately said first pressure;
• a second chamber coupled to said first chamber by a duct, wherein a portion of a source vapor produced by irradiating said first and second source materials by said electron beam passed through said duct, wherein said source vapor passing through said duct pumps said first chamber;
• a second vacuum system coupled to said second chamber for evacuating said second chamber to a second pressure, wherein said second pressure is higher than said first pressure;
• a gas source coupled to said second chamber, wherein said nanoparticles are formed within said second chamber upon collision of a gas from said gas source with said portion of said source vapor passing through said duct;
• and
• a cooling system coupled to at least a portion of said second chamber and sufficiently cooling said second chamber portion to cause at least a portion of said formed nanoparticles to condense on a surface of said second chamber portion.

A nanoparticle production system capable of producing nanoparticles at a rate of kilograms per hour, said system comprising:

• a vacuum enclosure;
• a first vacuum system coupled to said vacuum enclosure;
• a first chamber within said vacuum enclosure, wherein said first chamber is open to said vacuum enclosure, and wherein said first vacuum system maintains said first chamber at a first pressure of less than 10.sup.-4 torr;
• a crucible within said first chamber for holding a source material;
• an electron gun for producing an electron beam, wherein said electron gun is maintained at said first pressure;
• a second chamber within said vacuum enclosure and coupled to said first chamber by a duct wherein a portion of a source vapor produced by irradiating said source material by said electron beam passes through said duct into said second chamber, wherein at least a portion of a wall of said second chamber is at a reduced temperature;
• a vacuum port coupled to said second chamber and passing through said vacuum enclosure;
• a second vacuum system coupled to said vacuum port for maintaining a second pressure within said second chamber of more than 10.sup.-4 torr;
• a gas inlet coupled to said second chamber and passing through said vacuum enclosure, wherein said nanoparticles are formed within said second chamber upon collision of a gas admitted into said second chamber through said gas inlet with said portion of said source vapor passing through said duct, wherein at least a portion of said formed nanoparticles condense on said portion of said wall of said second chamber;
• at least one scraper within said second chamber, said scraper dislodging a portion of said condensed nanoparticles;
• and
• a collection bin within said second chamber positioned to collect a portion of said dislodged nanoparticles.

A nanoparticle production system capable of producing nanoparticles at a rate of kilograms per hour, said system comprising:

• a vacuum enclosure;
• a first vacuum system coupled to said vacuum enclosure;
• a first chamber within said vacuum enclosure, wherein said first chamber is open to said vacuum enclosure, and wherein said first vacuum system maintains said first chamber at a first pressure of less than 10.sup.-4 torr;
• a first crucible within said first chamber for holding a first source material;
• a second crucible within said first chamber for holding a second source material;
• an electron beam gun for producing an electron beam, wherein said electron beam gun is maintained at said first pressure;
• a second chamber within said vacuum enclosure and coupled to said first chamber by a duct wherein a portion of a source vapor produced by irradiating said first source material and said second source material by said electron beam passes through said duct into said second chamber, wherein at least a portion of a wall of said second chamber is at a reduced temperature;
• a vacuum port coupled to said second chamber and passing through said vacuum enclosure;
• a second vacuum system coupled to said vacuum port for maintaining a second pressure within said second chamber of more than 10.sup.-4 torr;
• a gas inlet coupled to said second chamber and passing through said vacuum enclosure, wherein said nanoparticles are formed within said second chamber upon collision of a gas admitted into said second chamber through said gas inlet with said portion of said source vapor passing through said duct, wherein at least a portion of said formed nanoparticles condense on said portion of said wall of said second chamber;
• at least one scraper within said second chamber, said scraper dislodging a portion of said condensed nanoparticles;
• and
• a collection bin within said second chamber positioned to collect a portion of said dislodged nanoparticles.