Method of and apparatus for the purification of gases and liquids
AssigneeUltralight AG
InventorsKarl Przybilla, Gerold Paesold
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AssigneeUltralight AG
InventorsKarl Przybilla, Gerold Paesold
Estimating the term…
In a method of purifying contaminated liquids and gases, a continuous surface film (31) is produced by means of a nozzle (15) and is simultaneously irradiated by a suitable radiation source (17), e.g. an UV lamp. The surface film (31) is discharged as a falling or trickling film (33) which is also exposed to the radiation. A gas for purification is passed through the surface film (31). In these conditions the pollution particles and other pollutants in the gas are absorbed by the liquid. The advantage of the process described is that decomposition of the pollutants can take place both in the gas phase and in the liquid phase. Gas pollutants which are not decomposed in the gas phase are absorbed by the liquid, where they are finally decomposed. With the present invention liquids and gases can be treated simultaneously.
A method of treating gases or liquids or both gases and liquids containing pollutants in a reactor having an inner wall and a passageway adjacent thereto, the method comprising:
A method of treating gases or liquids or both gases and liquids containing pollutants in a reaction having an inner wall and a passageway adjacent thereto, the method comprising:
An apparatus for the treatment of gases or liquids or both gases and liquids containing pollutants, comprising a reactor having an inner wall and a passageway adjacent thereto, at least one radiation source disposed in the reactor for irradiation of the reactor interior with electromagnetic radiation, a top inlet in the reactor for introducing the liquid and a bottom outlet in the reactor for removing the liquid, a conveyor to convey the liquid to the liquid inlet, at least one nozzle communicating with the conveyor and disposed in the reactor to generate a cohesive surface film between the inner wall of the reactor and the nozzle, a gas inlet in the reactor and a gas outlet in the reactor to enable a gas to be passed through the cohesive surface film.
Dependencies are inferred from the claim text.