Method for washing both surfaces of a substrate

A method for washing both surfaces of a substrate, comprising:

• (A) a first washing step for washing a front surface of a substrate, which is kept rotated, by bringing a scrubbing member into contact with said front surface of the substrate while supplying a washing liquid onto the front surface;
• (B) a second washing step for washing a back surface of the substrate, which is kept rotated, by bringing a scrubbing member into contact with said back surface of the substrate while supplying a washing liquid onto the back surface;
• (C) a heating step for drying under heat the front and back surfaces of the substrate;
• (D) a first recipe determining step for determining whether said heating step (C) is performed at a period between said first washing step (A) and said second washing step (B) and at a period after the second washing step (B), respectively, whether the heating step (C) is performed only after the second washing step (B), or whether the heating step (C) is not performed;
• (E) a conducting step for performing or not performing the heating step (C) in accordance with the recipe determined in said recipe determining step;
• (F) a second recipe determining step for determining whether or not the front surface of the substrate should be irradiated with an ultraviolet light before said first washing step (A);
• and
• (G) an ultraviolet light irradiation step for irradiating the front surface of the substrate with an ultraviolet light in accordance with the recipe determined in said second recipe determining step (D).