Polishing apparatus with support columns supporting multiple platform members

An apparatus for polishing a workpiece, comprising:

• a superstructure;
• an upper polish plate;
• a lower polish plate positioned beneath said upper polish plate;
• platform means disposed above said upper polish plate and supported by said superstructure, said platform means including first and second platform members, with the first platform member disposed above the second platform member;
• linking means linking said first and second platform members together to allow said first and said second platform members to move away from each other a defined, maximum amount;
• hanging support means for hangingly supporting the upper polish plate from the first platform member, said second platform member defining a central passageway through which said hanging support means passes;
• a plurality of stop blocks supported by said superstructure so as to interfere with said second platform member so as to limit the movement thereof, and so as to support said second platform member at a fixed position above said upper polish plate;
• and
• resilient bias means coupling said hanging support means and said first platform member;
• and
• means for moving said first platform member toward and away from said lower polish plate to bring said upper polish plate into contact with said workpiece with a polishing pressure and to control the polishing pressure.

An apparatus for polishing a workpiece, comprising:

• a superstructure;
• an upper polish plate;
• a lower polish plate positioned beneath said upper polish plate;
• platform means disposed above said upper polish plate and supported by said superstructure, said platform means including first and second platform members, with the first platform member disposed above the second platform member;
• hanging support means for hangingly supporting the upper polish plate from the first platform member, said second platform member defining a central passageway through which said hanging support means passes;
• a plurality of stop blocks supported by said superstructure so as to interfere with said second platform member so as to limit the movement thereof, and so as to support said second platform member at a fixed position above said upper polish plate;
• and
• resilient bias means coupling said hanging support means and said first platform member;
• means for moving said first platform member toward and away from said lower polish plate to bring said upper polish plate into contact with said workpiece with a polishing pressure and to control the polishing pressure;
• said hanging support means comprising a shaft having a lower end affixed to said upper polish plate and having a central axis, with means for mounting the central shaft for rotation about its central axis, and an outer sleeve means disposed about said central shaft, engaging said resilient bias means;
• and
• a lifting platform disposed above said first platform member and wherein said resilient bias means is mounted atop said first platform member, supporting said lifting platform from below.

An apparatus for polishing a workpiece, comprising:

• a superstructure;
• an upper polish plate;
• a lower polish plate positioned beneath said upper polish plate;
• platform means disposed above said upper polish plate and supported by said superstructure, said platform means including first and second platform members, with the first platform member disposed above the second platform member;
• said first and said second platform members have a generally triangular configuration and said superstructure includes support columns passing through apertures formed in said second platform member so as to provide sliding support therefor;
• hanging support means for hangingly supporting the upper polish plate from the first platform member, said second platform member defining a central passageway through which said hanging support means passes;
• a plurality of stop blocks supported by said superstructure so as to interfere with said second platform member so as to limit the movement thereof, and so as to support said second platform member at a fixed position above said upper polish plate;
• and
• resilient bias means coupling said hanging support means and said first platform member;
• and
• means for moving said first platform member toward and away from said lower polish plate to bring said upper polish plate into contact with said workpiece with a polishing pressure and to control the polishing pressure.