Strain induce control of polarization states in vertical cavity surface emitting lasers and method of making same
OwnerJagadeesh Pamulapati, Paul H. Sheninventors
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Abstract
A vertical cavity surface emitting laser is formed by eutectically bonding a laser cavity, defined by an active layer disposed between first and second, stacked mirror assemblies, to a host substrate which has a predetermined anisotropic coefficient of thermal expansion. During the forming process, a uniaxial strain is induced within the laser cavity. With this arrangement, large arrays of vertical cavity surface emitting lasers can be formed with predetermined polarization states that are based on the selected anisotropic host substrate.
Claims17
A vertical cavity surface emitting laser comprising:
- a substrate having a predetermined anisotropic coefficient of thermal expansion;
- and
- a laser cavity including a first mirror, a second mirror and an active layer disposed between said first and second mirrors, said laser cavity being eutectically bonded to said substrate with an induced uniaxial strain, wherein light formed by the laser cavity is linearly polarized.
A method of producing a vertical cavity surface emitting laser having a calculated output polarization comprising:
- forming a laser cavity assembly by sandwiching an active layer between first and second mirror layers;
- and
- bonding said laser cavity assembly to a host substrate formed of a material having a predetermined anisotropic coefficient of thermal expansion.
A method of producing a vertical cavity surface emitting laser comprising:
- providing a substrate layer;
- expitaxially growing an etch stop layer on said substrate layer;
- expitaxially growing a first quarter wave stack mirror of alternating layers of high and low refractive materials on said etch stop layer;
- expitaxially growing an active layer, formed from a multiple quantum well material, on said first quarter wave stack mirror;
- growing a second quarter wave stack mirror of alternating layers of high and low refractive materials on said active layer to form an intermediate assembly;
- eutectically bonding said intermediate assembly to a host substrate formed of a material having an anisotropic coefficient of thermal expansion;
- thinning down said substrate layer to within a desired thickness range;
- chemically etching said substrate layer;
- removing said etch stop layer;
- and
- securing electrodes to the intermediate assembly.
Dependencies are inferred from the claim text.