Abrasive pad and manufacturing method thereof and substrate polishing method using said abrasive pad
AssigneeSony Corporation
InventorHideharu Nakajima
Life of this patent
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Abstract
An abrasive pad whose abrasive surface has recesses that allow abrasive slurry to stay there is used instead of forming scratches on the abrasive surface of an abrasive pad. This eliminates a dressing operation for forming innumerable scratches on the abrasive surface of an abrasive pad in polishing a wafer. Omitting a dressing step from a wafer polishing process lowers the degree of impurity contamination of a wafer, and eliminating a dresser from a polishing apparatus reduces its cost.
Claims4
An abrasive pad to be used for a polishing operation in which a substrate is caused to slide on the abrasive pad while abrasive slurry is supplied to a surface of the abrasive pad and a sliding surface of the substrate is thereby flattened, comprising:
- a plate-like base member;
- and
- a plurality of fiber threads made of a fiber material, one ends of the respective fiber threads projecting from a surface of the plate-like base member wherein a coefficient of thermal expansion of the base is greater than a coefficient of thermal expansion of the fiber threads.
A manufacturing method of an abrasive pad, comprising the steps of:
- molding a base member so that the base member surrounds a plurality of erected fiber threads and fills in a space around the fiber threads;
- cutting the base member and the fiber threads together perpendicularly to an erecting direction of the fiber threads, to produce a plate member of a predetermined thickness;
- and
- causing recesses to be formed on a surface of the plate member when the base member contracts wherein a coefficient of thermal expansion of the base is greater than a coefficient of thermal expansion of the fiber threads.
Dependencies are inferred from the claim text.