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US 5,935,403 AGranted
Magnetic thin film and magnetic thin film manufacturing method
AssigneeRead-Rite SMI Corporation
InventorsKoichi Suzuki, Kenji Komaki
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AssigneeRead-Rite SMI Corporation
InventorsKoichi Suzuki, Kenji Komaki
Estimating the term…
A magnetic thin film manufacturing method in which an object of treatment is electroplated in a plating bath so that a magnetic thin film is formed on the surface of the object of treatment. The plating bath contains two or more types of ions selected from a set consisting of Fe.sup.2+ ions, Ni.sup.2+ ions and Co.sup.2+ ions, and fine particles of an insulating material are dispersed in the plating bath. In a more particular embodiment of the invention, a magnetic thin film manufacturing method is characterized by the fact that a! the aforementioned two or more types of ions selected from a set consisting of Fe.sup.2+ ions, Ni.sup.2+ ions and Co.sup.2+ ions are supplied by means of sulfates and/or chlorides, b! the plating bath is an acidic bath, and c! the fine particles of an insulating material that are dispersed in the plating bath are colloidal particles of SiO.sub.2 and/or Al.sub.2 O.sub.3.
A magnetic thin film manufacturing method comprising the steps of electroplating an object of treatment in a plating bath so that a magnetic thin film is formed on a surface of said object of treatment, the plating bath containing two or more metal ions selected from the group consisting of Fe.sup.2+ ions, Ni.sup.2+ ions and Co.sup.2+ ions, and dispersing SiO.sub.2,Al.sub.2 O.sub.3, or a combination thereof in the plating bath, the fine particles having a size less than approximately 30 nm, the magnetic thin film having a Co weight content of at least 50%.
Dependencies are inferred from the claim text.