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US 5,929,438 AGranted
Cantilever and measuring apparatus using it
AssigneeNikon Corporation
InventorsYoshihiko Suzuki, Miyuki Niikura, Tetsuji Onuki
Life of this patent
Estimating the term…
Abstract
The present invention relates to a cantilever for separately observing a temperature profile of a surface of a sample and the topography thereof. The cantilever of the present invention comprises a support, a flexible plate one end of which is supported by the support, and a probe provided at the tip of the flexible plate, in which a thermocouple is provided in the probe.
Claims31
A cantilever comprising:
- a flexible plate formed of one or more layers of thin films;
- a support for supporting one end of said flexible plate;
- an electrically and thermally conductive probe projecting from a tip of said flexible plate;
- and
- a thermocouple formed by contact of two different kinds of metals, said contact being formed in only a tip portion of said probe.
2 more elements
A cantilever comprising:
- a thin-film beam portion having an opening;
- a support for supporting one end of said thin-film beam portion;
- and
- a probe projecting from said thin-film beam portion, a through hole penetrating from a top part of said probe to said opening of said thin-film beam portion,
- wherein said probe is constructed of silicon dioxide formed by thermal oxidation of silicon.
2 more elements
A cantilever comprising:
- a thin-film beam portion;
- a support for supporting one end of said thin-film beam portion;
- and
- a probe projecting from said thin-film beam portion, said probe having a projection with electric conduction, and a silicon dioxide film, which covers a tip of said probe and surroundings of said projection, the thickness of said silicon dioxide film covering the tip of said probe being thinner than the thickness of said silicon dioxide film covering the surroundings of said projection.
1 more element
A scanning probe microscope for observing a sample, comprising:
- a thin-film beam portion;
- a support for supporting one end of said thin-film beam portion;
- a probe projecting from said thin-film beam portion, said probe having a projection with electric conduction, and a silicon dioxide film, which covers a tip of said probe and surroundings of said projection, the thickness of said silicon dioxide film covering the tip of said probe being thinner than the thickness of said silicon dioxide film covering the surroundings of said projection;
- and
- a first moving mechanism for effecting relative movement between said support and said sample in a direction substantially parallel to a surface of said sample.
2 more elements
Dependencies are inferred from the claim text.