Method of manufacturing micro-tip for detecting tunneling current or micro-force or magnetic force
AssigneeCanon Kabushiki Kaisha
InventorsYasuhiro Shimada, Takayuki Yagi, Tsutomu Ikeda
Life of this patent
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Abstract
A micro-tip for detecting tunneling current, micro force or magnetic force is manufactured as follows. A recess portion is formed on the surface of a first substrate. A peeling layer are formed on the substrate including the recess of the first substrate. A micro-tip is formed on the peeling layer of the first substrate. A joining layer is formed on a second substrate. The micro-tip on the peeling layer including the recess in the first substrate is transferred onto the joining layer on the second substrate. The peeling layer mainly consists of an oxide or a nitride, of a metal element, a semi-metal element or a semiconductor element.
Claims37
A method of manufacturing a micro-tip for detecting tunneling current, micro force or magnetic force, which comprises the steps of:
- forming a recess portion on the surface of a first substrate;
- forming a peeling layer on said first substrate containing said recess of said first substrate;
- forming a micro-tip on the peeling layer of said first substrate;
- forming a joining layer on a second substrate;
- and
- transferring said micro-tip on the peeling layer containing said recess in said first substrate onto the joining layer on said second substrate;
- wherein, said peeling layer mainly consists of an oxide or nitride, of a metal element, a semi-metal element or a semiconductor element.
A female mold substrate used for manufacturing a micro-tip for detecting tunneling current, micro-force or magnetic force, which comprises:
- a recess formed on the surface of said female mold substrate;
- and
- a peeling layer provided on said substrate containing said recess;
- wherein said peeling layer mainly consists of an oxide or nitride, of a metal element, a semi-metal element or a semiconductor element.
A probe provided with a micro-tip for detecting tunneling current, micro-force or magnetic force, which comprises:
- a lever formed on a substrate;
- a joining layer formed on said lever;
- and
- a micro-tip formed on said joining layer;
- wherein a hollow space is present between said joining layer and said micro-tip.
A method of manufacturing a probe having a micro-tip for detecting tunneling current, micro-force or magnetic force, which comprises the steps of:
- forming a recess on the surface of a first substrate comprising silicon;
- forming a peeling layer on said first substrate containing the recess of said first substrate;
- forming a micro-tip on the peeling layer of said first substrate;
- forming a layer comprising an elastic material on a second substrate;
- forming a joining layer on the layer comprising the elastic material of said second substrate;
- transferring the micro-tip formed on said first substrate onto the joining layer on said second substrate;
- and
- removing part of said second substrate to form an elastic member comprising said elastic material;
- wherein said peeling layer mainly consists of an oxide or nitride, of a metal element, a semi-metal element or a semiconductor element.
A method of manufacturing a probe having a micro-tip for detecting tunneling current, micro-force or magnetic force, which comprises the steps of:
- forming a recess on the surface of a first substrate comprising silicon;
- forming a peeling layer on the surface containing the recess of said first substrate;
- forming a micro-tip on the peeling layer of said first substrate;
- forming a joining layer comprising a resin film on a second substrate and/or on a third substrate having a beam pattern formed thereon;
- binding said second substrate and said third substrate together via said joining layer;
- shaping said third substrate into a flat thin film on said second substrate;
- forming a joining layer on said flat thin film;
- forming a supporting portion, which supports said flat thin film on said second substrate, on said second substrate;
- transferring the micro-tip on said first substrate onto the joining layer on said flat thin film;
- and
- removing the joining layer between said second substrate and said flat thin film, to form a gap between said flat thin film and said second substrate;
- wherein said peeling layer mainly consists of an oxide or nitride, of a metal element, a semi-metal element or a semiconductor element.
A method of manufacturing a probe having a micro-tip for detecting tunneling current, micro-force or magnetic force, which comprises the steps of:
- forming a recess on the surface of a first substrate comprising silicon;
- forming a peeling layer on the surface containing the recess of said first substrate;
- forming a micro-tip on the peeling layer of said first substrate;
- forming a lever comprising monocrystal Si through the peeling layer on a second substrate comprising a monocrystal Si material;
- forming a joining layer on said lever;
- transferring said micro-tip onto said joining layer;
- and
- removing said second substrate and the peeling layer on the back of said lever, to form a gap on the rear surface of said lever;
- wherein said peeling layer mainly consists of an oxide or nitride, of a metal element, a semi-metal element or a semiconductor element.
A probe unit provided with a micro-tip for detecting tunneling current, micro-force or magnetic force, which comprises:
- a monocrystal Si substrate having a signal processing IC formed thereon;
- an insulating layer formed on said substrate;
- a lever comprising monocrystal Si partially supported by said insulating layer;
- a micro-tip, comprising a metal, arranged on said lever through a joining layer;
- and
- an electric wiring for transmitting a signal detected by said micro-tip to said IC,
- wherein a hollow space is present between said micro-tip and said joining layer.
Dependencies are inferred from the claim text.