Photo-encoded selective etching for glass based microtechnology applications
AssigneeBrown University Research Foundation
InventorNabil M Lawandy
Life of this patent
Estimating the term…
Abstract
Two-photon excitation of charge carriers in boron E'-center containing borosilicate glasses is shown to result in a photo-encoding of selectively etchable regions. Using a turbulent process followed by polishing, a number of patterning capabilities for microtechnology applications are achieved, such as ultra-fast capillary electrophoresis chips and rapid prototyping of diffractive optical elements.
Claims50
A method for selectively removing material from a substrate, comprising the steps of:
- providing a substrate comprised of a material that is capable of trapping charge carriers at sites in response to illumination with electromagnetic radiation having wavelengths within a predetermined range of wavelengths, the material being comprised of a glass that contains boron;
- selectively illuminating at least one portion of a surface of the substrate where it is desired to remove a portion of the material, the step of selectively illuminating comprising the steps of generating electromagnetic radiation having wavelengths within the predetermined range of wavelengths and directing the generated electromagnetic radiation to the at least one portion of the surface;
- and
- applying an etchant to the surface for removing the material within the selectively illuminated portion.
A method for selectively removing material from a substrate, comprising the steps of:
- providing a substrate comprised of a boron-containing glass that is capable of trapping charge carriers at sites in response to illumination with electromagnetic radiation having wavelengths within a predetermined range of wavelengths;
- selectively illuminating at least one portion of a surface of the substrate where it is desired to remove a portion of the material, the step of selectively illuminating comprising the steps of generating electromagnetic radiation having wavelengths within the predetermined range of wavelengths and directing the generated electromagnetic radiation to the at least one portion of the surface;
- applying an etchant to the surface for removing the material within the selectively illuminated portion, the step of applying an etchant including the steps of immersing the substrate in an acid bath, and rotating the substrate during a time that the substrate is immersed;
- and
- polishing the surface to remove surface roughness.
A system for selectively removing material from a substrate, comprising:
- means for supporting a substrate comprised of a boron-containing glass that is capable of trapping charge carriers at sites in response to illumination with electromagnetic radiation having wavelengths within a predetermined range of wavelengths;
- means for selectively illuminating at least one portion of a surface of the substrate where it is desired to remove a portion of the material, said means for selectively illuminating comprising means for generating electromagnetic radiation having wavelengths within the predetermined range of wavelengths, and means for directing the generated electromagnetic radiation to the at least one portion of the surface;
- and
- means for applying an etchant to the surface for removing the material within the selectively illuminated portion, comprising means for rotating the substrate in an etchant bath.
An article of manufacture comprising a monolithic structure comprised of a boron-containing glass that is capable of trapping charge carriers at sites in response to illumination with electromagnetic radiation having wavelengths within a predetermined range of wavelengths, said monolithic structure having at least one optically induced region containing trapped charge carriers and that extends at least partially through a thickness of said structure, said at least one region having a characteristic etch rate that is faster than a characteristic etch rate of said glass.
A method of microfabrication, comprising the steps of:
- selectively illuminating a surface of a glass substrate with light, the glass substrate containing boron and being capable of trapping charge carriers at sites in response to illumination with electromagnetic radiation having wavelengths within a predetermined range of wavelengths;
- and
- etching the surface to remove only those portions of the surface that were selectively illuminated, thereby forming three dimensional features in said surface.
A method of microfabrication, comprising the steps of:
- selectively illuminating a surface of a core of an optical fiber, the core being comprised of a glass doped with germanium dioxide and being capable of trapping charge carriers at sites in response to illumination with electromagnetic radiation having wavelengths within a predetermined range of wavelengths;
- and
- etching the surface to remove only those portions of the surface that were selectively illuminated, thereby forming three dimensional features in said surface.
Dependencies are inferred from the claim text.