Coating method and apparatus for semiconductor process

A method of coating a target region of a semiconductor wafer substrate or an liquid crystal display (LCD) substrate with a coating liquid consisting of a photo-resist liquid or a developing liquid of a photo-resist, comprising:

• supporting said semiconductor wafer substrate or said LCD substrate on a planar support surface;
• pre-coating at least a portion of said target region with a solvent for said coating liquid by supplying said solvent onto said at least a portion of said target region from a solvent supply port while moving said solvent supply port in a straight line direction from a location adjacent to a first end portion of the target region to a location adjacent to a second end portion of the target region;
• and
• coating said at least a portion of said target region with said coating liquid immediately after said pre-coating step by supplying said coating liquid to overlap said solvent on said at least a portion of said target region from a coating liquid supply port while moving said coating liquid supply port along with but immediately behind said solvent supply port in said straight line direction.