# US 5,916,735 A · Method for manufacturing fine pattern > Agents: this data is available as JSON from the patentgrep API and MCP server — see https://patentgrep.com/llms.txt - Number: US 5,916,735 A - Document ID: US5916735A - Status: Granted - Kind: A - Application number: 08/967,941 - Filed: 1997-11-12 - Granted: 1999-06-29 - Earliest claimed: 1996-11-21 - Assignees: Matsushita Electric Industrial Co., Ltd. - Inventors: Kouji Nakashima; Keita Ihara; Hidetoshi Matsumoto; Takahiro Oomori - Web page: https://patentgrep.com/patent/US5916735A ## CPC - G02F 1/133516: {Methods for their manufacture, e.g. printing, electro-deposition or photolithography} - G03C 7/12: by photo-exposure {(photomechanical production of optical colour artifacts such as colour screens, for purposes other than for additive colour photography G03F7/0007)} - G03F 7/164: {using electric, electrostatic or magnetic means; powder coating} - H05K 3/0079: {characterised by the method of application or removal of the mask (H05K3/0091 takes precedence)} - G02F 1/133512: {Light shielding layers, e.g. black matrix (G02F1/136209 takes precedence)} - H05K 3/061: {Etching masks} - H05K 3/108: {by semi-additive methods; masks therefor (characterised by metallic etch mask H05K3/062; electroplating methods or apparatus H05K3/241)} - H05K 2203/0117: Pattern shaped electrode used for patterning, e.g. plating or etching - H05K 2203/0537: Transfer of pre-fabricated insulating pattern - H05K 2203/135: Electrophoretic deposition of insulating material - G02F: OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS - G03C: PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES (for photomechanical purposes G03F); PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY (photographic processes characterised by the use or manipulation of apparatus classifiable per se in subclass G03B, see G03B; photomechanical production of textured or patterned surfaces G03F; electrophotography, magnetography G03G) - G03F: PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR; (phototypographic composing devices B41B; photosensitive materials or processes for photographic purposes G03C; electrophotography, sensitive layers or processes therefor G03G) - H05K: PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS ## Abstract A method for manufacturing a fine pattern is provided which method makes it possible to well reproducibly and completely strip and transfer the fine pattern, repetitively use a master substrate, and simply form a high-definition and high-density fine pattern with good massproductivity. Further, a color filter and a shading pattern filter are implemented by the fine pattern. A color LCD element with the color filter is provided which enables to output a well color-reproducibly high-quality image with no color or brightness evenness. Moreover, a color LCD element is provided which enables to continuously output a coloring function for a certain length of time after light from a light source or ambient light disappears and form a brighter and more vivid image. The method for manufacturing a fine pattern includes the steps of forming a master substrate having an electrode layer patterned to a predetermined shape, forming peel layers made of a conductive water-repellent thin film on the master substrate, forming the fine pattern made of the electrodeposit resin on the peel layers, impregnating the electrodeposit resin with water, and stripping the fine pattern off the master substrate and transferring the fine pattern on a bonding layer of the media substrate. The color filter and the shading pattern filter are manufactured by the method for manufacturing the fine pattern. The color LCD element includes plastic film substrates, a transparent pixel electrode, a liquid crystal material, and color filters. The color filters are pasted on the plastic film with a bonding film laid therebetween. The color LCD element includes fine emittable filters two-dimensionally created as the color filter on a light-transmissive substrate so that the emittable filter is composed to seal at least one kind of the light-storage and the fluorescent coloring particles is sealed in-the electrodeposit resin layer. ## Claims ### Claim 1 A method for manufacturing a fine pattern comprising the steps of: forming a master substrate having an insulating substrate and an electrode layer patterned to a predetermined shape and formed on said insulating substrate; forming a peel layer formed of a conductive and water-repellent thin film on said master substrate; forming a fine pattern made of electrodeposit resin on said peel layer; impregnating said electrodeposit resin with water; and stripping said fine pattern off said master substrate and transferring said fine pattern on a bonding layer of a media substrate. ### Claim 2 (depends on 1) The method for manufacturing a fine pattern as claimed in claim 1, wherein the process at said water-impregnating step is executed to impregnate said electrodeposit resin with water of a temperature of 30.degree. C. to 70.degree. C. ### Claim 3 (depends on 2) The method for manufacturing a fine pattern as claimed in claim 2, wherein the process at said water-impregnating step is executed to impregnate said electrodeposit resin with water of a temperature of about 50.degree. C. ### Claim 4 (depends on 1) The method for manufacturing a fine pattern as claimed in claim 1, wherein the process at said strip and transfer step is executed to strip and transfer said fine pattern on said bonding layer of said media substrate being heated. ### Claim 5 (depends on 1) The method for manufacturing a fine pattern as claimed in claim 1, wherein the process at said strip and transfer step is executed to keep said master substrate in contact with said media substrate and heat and pressure both of said substrates, for stripping and transferring said fine pattern. ### Claim 6 (depends on 1) The method for manufacturing a fine pattern as claimed in claim 1, wherein the process at said step of forming the peel layer is executed to form said peel layer made of a metal film containing fluororesin on said master substrate. ### Claim 7 (depends on 1) The method for manufacturing a fine pattern as claimed in claim 1, wherein the process at said step of forming said peel layer is executed to form the peel layer made of a fluororesin thin film on said master substrate. ### Claim 8 (depends on 1) The method for manufacturing a fine pattern as claimed in claim 1, wherein the process at said step of forming said peel layer is executed to form the peel layer made of a fluoro-system coating agent. ### Claim 9 (depends on 8) The method for manufacturing a fine pattern as claimed in claim 8, wherein said peel layer is formed to have a thickness of 5 nm to 100 nm.