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US 5,906,753 AGranted
Method of making optical semi-conductor device
AssigneeMitsubishi Denki Kabushiki Kaisha
InventorsToshitaka Aoyagi, Yasunori Miyazaki
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Abstract
A method of manufacturing an optical semiconductor device including forming an optical waveguide on a substrate and forming an alignment mark on the substrate simultaneously with the optical waveguide. The alignment marks do not transmit infrared light and, when the substrate is mounted on an infrared transmissive submount, precise alignment can be achieved by observing transmitted light. Thus, the optical semiconductor device including the substrate is soldered at the desired location.
Claims9
A method of manufacturing an optical semiconductor device comprising:
- forming an optical waveguide on a substrate and forming an alignment mark on the substrate at the same time as forming said optical waveguide;
- forming a conductive layer on said substrate after forming said optical waveguide and said alignment mark;
- forming an insulating film on said conductive layer;
- forming a front surface electrode on said insulating film;
- and
- forming a back surface electrode on a back surface of said substrate.
3 more elements
Dependencies are inferred from the claim text.