Low temperature inert gas purifier
AssigneeDDI Corporation
InventorsGiovanni Carrea, Brian D. Warrick
Life of this patent
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Abstract
A two-stage process method for removal of impurities such carbon monoxide, carbon dioxide, oxygen, water, hydrogen, and methane from inert gases at ambient temperature (0.degree.-60.degree. C.). In the first stage the inert gas is contacted with a nickel catalyst, and in the second stage the inert gas is passed over a getter alloy. Purified gas exiting the second stage of the purifier contains less than one part per billion (ppb) levels of the impurities. The nickel catalyst and getter alloy are initially activated at elevated temperature. The catalyst and getter may be reactivated by heating and purging, and hydrogen previously removed from impure gas can be used in the reactivation process.
Claims24
A purifier apparatus for low temperature removal of impurities from a noble gas or nitrogen at temperatures between 0.degree. C. and 60.degree. C., the apparatus having a plurality of purification zones consisting of:
- (a) a first purification zone containing a particulate material including elemental nickel;
- and
- (b) a second purification zone containing a getter material;
- wherein the gas is first contacted with the nickel containing material and subsequently contacted with the getter material at temperatures, thereby removing impurities from the gas.
A method for low temperature removal of impurities from a noble gas or nitrogen at temperatures between 0.degree. C. and 60.degree. C., consisting of:
- (a) contacting the gas with a particulate material including elemental nickel at temperatures between 0.degree. C. and 60.degree. C.;
- and
- (b) without intermediate heating and cooling, subsequently contacting the gas with a getter material at temperatures between 0.degree. C. and 60.degree. C.;
- thereby removing impurities from the gas.
A purifier apparatus for low temperature removal of impurities from a noble gas or nitrogen at temperatures between 0.degree. C. and 60.degree. C., the apparatus having a plurality of purification zones consisting of:
- (a) a first purification zone containing a particulate material including elemental nickel;
- (b) a second purification zone containing a molecular sieve material;
- and
- (c) a third purification zone containing a getter material;
- wherein the gas is first contacted with the nickel containing material, then contacted with the molecular sieve material, and subsequently contacted with the getter material at temperatures between 0.degree. C. and 60.degree. C., thereby removing impurities from the gas.
A method for low temperature removal of impurities from a noble gas or nitrogen at temperatures between 0.degree. C. and 60.degree. C., consisting of the steps of:
- (a) first contacting the gas with a particulate material including elemental nickel at temperatures between 0.degree. C. and 60.degree. C.;
- (b) without intermediate heating and cooling, then contacting the gas with a molecular sieve material at temperatures between 0.degree. C. and 60.degree. C.;
- and
- (c) without intermediate heating and cooling, then contacting the gas with a getter material at temperatures between 0.degree. C. and 60.degree. C.
Material comprises at least a material selected from the group consisting of alumina and silica.
Dependencies are inferred from the claim text.