Laser processing apparatus
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Hongyong Zhang, Hiroaki Ishihara
Life of this patent
Estimating the term…
Loading patent…
AssigneeSemiconductor Energy Laboratory Co., Ltd.
InventorsShunpei Yamazaki, Hongyong Zhang, Hiroaki Ishihara
Estimating the term…
A laser processing apparatus including a laser device for emitting a first laser beam having a first cross section having a length and a width and an optical system for modifying the first laser beam to produce a second laser beam having a virtual focus. The second laser beam has a second cross section of which length is larger than the length of the first cross section and is constant with propagation of the second laser beam. The apparatus further includes a condenser located after the virtual focus for focusing the second laser beam on a specimen to be treated, wherein said second laser beam is condensed in only a widthwise direction of the cross section, and device for moving the specimen along the widthwise direction. Specifically, laser processing apparatus may include a laser device, a vertical fly-eye lens for homogenizing an intensity along a lengthwise direction of the first cross section, a mirror for directing the laser beam and cylindrical convex lens.
A laser processing apparatus for processing a semiconductor film comprising:
A laser processing apparatus for processing a semiconductor film comprising:
A laser processing apparatus for processing a semiconductor film comprising:
A laser processing apparatus for processing a semiconductor film comprising:
A laser processing apparatus for processing a semiconductor film comprising:
A laser processing apparatus for processing a semiconductor film comprising:
A laser processing apparatus for processing a semiconductor film comprising:
Dependencies are inferred from the claim text.