Cleaning agent and cleaning process for harmful gas
AssigneeJapan Pionics Co., Ltd.
InventorsHideki Fukuda, Kenji Otsuka, Satoshi Arakawa
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AssigneeJapan Pionics Co., Ltd.
InventorsHideki Fukuda, Kenji Otsuka, Satoshi Arakawa
Estimating the term…
There are disclosed a cleaning agent for removing a fluorine-compound gas such as hydrogen fluoride, fluorine, tungsten hexafluoride, silicon tetrafluoride and boron trifluoride which agent comprises a molded article produced by using strontium hydroxide as a principal component, an organic binding agent as a molding agent and the hydroxide of an alkaline earth metal other than strontium as a molding aid; and a process for cleaning a harmful gas which comprises feeding a harmful gas containing a fluorine-compound gas into a column packed inside with the above cleaning agent to remove the fluorine-compound gas; and exhausting a gas substantially free from the fluorine-compound gas. The above cleaning agent is capable of removing the fluorine-compound gas in high efficiency without causing any danger, thereby making itself well suited to the cleaning of the gases exhausted, for example, from semiconductor manufacturing industries.
A cleaning agent for removing a fluorine gas or fluorine-compound gas contained in an exhaust gas by bringing said exhaust gas into contact therewith, the cleaning agent comprises a molded article comprising strontium hydroxide, an organic binding agent as a molding agent and a hydroxide of an alkaline earth metal other than strontium, wherein said organic binder is at least one member selected from the group consisting of polyvinyl alcohol, polyethylene glycol, polypropylene glycol, methyl cellulose and carboxymethyl cellulose.
Dependencies are inferred from the claim text.