Process for producing trichlorosilane
AssigneeTokuyama Corporation
InventorsKanji Sakata, Kenji Hirota
Life of this patent
Estimating the term…
Abstract
A process for producing trichlorosilane by reacting silicon with hydrogen chloride, which comprises bringing at least one silane compound selected from the group consisting of dichlorosilane, monochlorosilane and monosilane into contact with silicon during or prior to a reaction between silicon and hydrogen chloride to remove silicon oxide on the surface of silicon, thereby improving the reactivity of silicon with hydrogen chloride to produce silicon trichloride stably. Further, an alkali metal compound is co-present in the reaction between silicon and hydrogen chloride to suppress the production of silicon tetrachloride, thereby making it possible to produce trichlorosilane at a high selectivity.
Claims14
A process for producing trichlorosilane by reacting silicon with hydrogen chloride, the process comprising bringing at least one silane compound selected from the group consisting of dichlorosilane, monochlorosilane and monosilane into contact with silicon during or prior to a reaction between silicon and hydrogen chloride, wherein the reaction between silicon and hydrogen chloride is carried out in the co-presence of a catalyst having a catalytic activity for producing trichlorosilane from silicon and hydrogen chloride and an alkali metal compound.
Dependencies are inferred from the claim text.