Particle monitoring instrument
AssigneeNEC Corporation
InventorsFumihiko Uesugi, Natsuko Ito
Life of this patent
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AssigneeNEC Corporation
InventorsFumihiko Uesugi, Natsuko Ito
Estimating the term…
When a intensity of a signal from a light detector 14 to measure a scattered light exceeds a predetermined value, a motion of a particle 20 is displayed as a locus of the scattered light, by means of extending an exposure time of the scattered light to the light detector, or by means of increasing a pulse oscillation frequency of a laser beam 13, or by means of extending a pulse width of the laser light. And then a straight line connecting start and terminal points of the locus is displayed to superimpose on the locus. An origin of the particle is estimated by extending the straight line beyond the start point, and a destination point of the particle is estimated by extending the straight line beyond the terminal point. A mass of the particle is estimated by dividing a projective length of the straight line in a vertical direction by the exposure time of the scattered light.
A particle monitoring instrument comprising:
A particle monitoring instrument comprising:
A particle monitoring instrument comprising:
Dependencies are inferred from the claim text.