LSI mask pattern edit apparatus with contour line intensity distribution display method of resolution for lithography
AssigneeKabushiki Kaisha Toshiba
InventorsSoichi Inoue, Satoshi Tanaka
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Abstract
An intensity distribution display method of displaying a intensity distribution of electromagnetic waves or charged particle beams fallen on a sample, is characterized by comprising the step of displaying the intensity distribution with the use of contour lines defined by Ie/(1+a.multidot.n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer.
Claims10
An intensity distribution display method of displaying a intensity distribution of electromagnetic waves or charged particle beams fallen on a sample, comprising the step of:
- displaying the intensity distribution with the use of contour lines defined by Ie/(1+a.multidot.n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer.
An intensity distribution display method of displaying a intensity distribution of electromagnetic waves or charged particle beams fallen on a sample, comprising the step of:
- displaying an inverse of the intensity distribution with the use of contour lines spaced at a constant rate relative to a desired exposure setting value.
A mask pattern edit apparatus comprising:
- means for inputting and editing the position of an LSI mask pattern;
- intensity distribution calculation means for determining a intensity distribution fallen through the LSI mask pattern on a photosensitive layer of a sample;
- display means for displaying the mask pattern and the intensity distribution at a time;
- and
- contour line calculation means for calculating and displaying the intensity distribution on the displaying means with the use of contour lines defined by Ie/(1+a.multidot.n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer.
A mask pattern edit apparatus comprising:
- means for inputting and editing the position of an LSI mask pattern;
- intensity distribution calculation means for determining a intensity distribution fallen through the LSI mask pattern on a photosensitive layer of a sample;
- display means for displaying the mask pattern and the intensity distribution at a time;
- contour line calculation means for calculating and displaying the intensity distribution on the displaying means with the use of contour lines defined by Ie/(1+a.multidot.n/100), where Ie is a desired intensity value, a is a constant rate (%), and n is an integer;
- and
- display switching means for selectively displaying either the contour lines determined by the contour line calculation means or the contour lines assigned at equal intervals of an intensity level.
A mask pattern edit apparatus comprising:
- means for inputting and editing the position of an LSI mask pattern;
- intensity distribution calculation means for determining a intensity distribution fallen through the LSI mask pattern on a photosensitive layer of a sample;
- display means for displaying the mask pattern and the intensity distribution at a time;
- and
- contour line calculation means for calculating and displaying an inverse of the intensity distribution on the displaying means with the use of contour lines spaced at a constant rate relative to a desired exposure setting value.
A mask pattern edit apparatus comprising:
- means for inputting and editing the position of an LSI mask pattern;
- intensity distribution calculation means for determining a intensity distribution fallen through the LSI mask pattern on a photosensitive layer of a sample;
- display means for displaying the mask pattern and the intensity distribution at a time;
- contour line calculation means for calculating and displaying an inverse of the intensity distribution on the displaying means with the use of contour lines spaced at a constant rate relative to a desired exposure setting value;
- and
- display switching means for selectively displaying either the contour lines determined by the contour line calculation means or the contour lines assigned at equal intervals of an intensity level.
Dependencies are inferred from the claim text.