US 5,861,549 AGranted

Integrated Silicon profilometer and AFM head

AssigneeXROS, Inc.

InventorsArmand P. Neukermans, Timothy G. Slater

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Abstract

A topographic head for profilometry and AFM supports a central paddle by coaxial torsion bars projecting inward from an outer frame. A tip projects from the paddle distal from the bars. The torsion bars include an integrated paddle rotation sensor. A XY stage may carry the topographic head for X and Y axis translation. The XYZ stage's fixed outer base is coupled to an X-axis stage via a plurality of flexures. The X-axis stage is coupled to a Y-axis stage also via a plurality of flexures. One of each set of flexures includes a shear stress sensor. A Z-axis stage may also be included to provide an integrated XYZ scanning stage. The topographic head's frame, bars and paddle, and the XYZ stage's stage-base, X-axis, Y-axis and Z-axis stages, and flexures are respectively monolithically fabricated by micromachining from a semiconductor wafer.

Claims20

Dependent claims

A micromachined XY scanning stage comprising:

an outer stage-base that is adapted to be held fixed with respect to a surface to be scanned;
an intermediate X-axis stage that is coupled to and supported from the stage-base by a plurality of flexures, at least one of the flexures coupling between said stage-base and said X-axis stage having a shear stress sensor formed therein for sensing stress in that flexure;
an inner Y-axis stage that is coupled to and supported from the X-axis stage by a plurality of flexures, at least one of the flexures coupling between said X-axis stage and said Y-axis stage having a shear stress sensor formed therein for sensing stress in that flexure;
said stage-base, X-axis stage, Y-axis stage, and flexures all being monolithically fabricated from a semiconductor single-crystal silicon layer of a substrate;
and
sensing means supported by, and carried for X-axis and Y-axis translation by, said X-axis stage and Y-axis stage.

3 more elements

Dependencies are inferred from the claim text.

Facts

Application: 08/762,589Filed 10 Dec 1996
Granted: 19 Jan 1999
Term ends: Not estimatedThe source records don’t support an estimate.

Classification9 codes

G01Q 60/38
AFM [Atomic Force Microscopy] or apparatus therefor, e.g. AFM probes: probes, their manufacture, or their related instrumentation, e.g. holders
G01B 7/34
Measuring arrangements characterised by the use of electric or magnetic techniques: for measuring roughness or irregularity of surfaces
G01Q 10/04
Scanning or positioning arrangements, i.e. arrangements for actively controlling the movement or position of the probe: fine scanning or positioning
Y10S 977/872
Scanning probe structure: positioner