Deposition of high quality conformal silicon oxide thin films on glass substrates
AssigneeApplied Materials, Inc.
InventorsKam Law, Robert Robertson, Guofu Jeff Feng
Life of this patent
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Abstract
A plasma enhanced chemical vapor deposition process for depositing conformal silicon oxide thin films useful to make thin film transistors which have stable electrical properties and low charge centers onto a substrate comprising flowing a precursor gas mixture of silane and nitrous oxide, the latter at a high rate, at a pressure of at least about 0.8 torr and a temperature of from about 250.degree. to 350.degree. C. The effective volume of the reaction region between the gas manifold inlet and the substrate during processing is kept small.
Claims2
A plasma-enhanced chemical vapor deposition process for depositing silicon oxides on a glass substrate in a processing chamber, comprising the steps of:
- heating a glass substrate in the process chamber to a temperature of between about 250.degree. and 350.degree. C.;
- introducing a precursor gas including silane and nitrous oxide through a gas inlet manifold, the precursor gas being introduced at a pressure of at least about 0.8 torr, the flow of silane through the gas inlet manifold being between about 100 and 400 sccm, the flow of nitrous oxide through the gas inlet manifold being between about 6000 and 10,000 sccm, and the distance between the gas inlet manifold and the substrate being between about 400 and 1500 mils;
- and
- generating a plasma of said precursor gas using a power density of less than about 0.3 and 0.5 watts per square centimeter to form an active conformal layer of silicon oxide having an index of refraction of between about 1.44 and 1.46.
A plasma-enhanced chemical vapor deposition process for depositing silicon oxides on a glass substrate in a process chamber, comprising the steps of:
- heating a glass substrate in the process chamber to a temperature of between about 250.degree. and 350.degree. C.;
- introducing a precursor gas including silane and nitrous oxide into the process chamber through a gas inlet manifold, the precursor gas being introduced at a pressure of at least about 0.8 torr, the flow of silane through the gas inlet manifold being between about 0.06 and 0.24 sccm per square centimeter of substrate area, the flow of nitrous oxide through the gas inlet manifold being between about 3.75 and 6.25 sccm per square centimeter of substrate area, and the distance between the gas inlet manifold and the substrate being between about 400 and 1500 mils;
- initiating a plasma of said precursor gas using a power density of less than about 0.5 watts per square centimeter;
- and
- varying the precursor gas flow rates of silane and nitrous oxide introduced into the process chamber, the substrate temperature, and the plasma-generating power density to form an active conformal layer of silicon oxide having an index of refraction of between about 1.44 and 1.46 .
Dependencies are inferred from the claim text.