Radio frequency generating systems and methods for forming pulse plasma using gradually pulsed time-modulated radio frequency power
AssigneeSamsung Electronics Co., Ltd.
InventorKyeong-koo Chi
Life of this patent
Estimating the term…
Loading patent…
AssigneeSamsung Electronics Co., Ltd.
InventorKyeong-koo Chi
Estimating the term…
A radio frequency (RF) generating system for forming pulse plasma utilizes a plasma reaction device comprises a function generator, an amplifier, and an input port. The function generator generates a signal of time-modulated RF power according to a modulation function having a waveform, wherein the waveform gradually ascends at a rising edge and gradually descends at a falling edge. The input port receives the signal from the function generator and transmits the signal to the amplifier. The amplifier amplifies the signal to a predetermined level and then transmits the amplified signal to the plasma reaction device. A method for forming pulse plasma comprises the steps of generating a time-modulated RF power signal according to a modulation function having a waveform, wherein the waveform is shaped to gradually ascend at a rising edge and to gradually descend at a falling edge, amplifying the time-modulated RF power signal to a predetermined level, and transmitting the amplified time-modulated RF power signal to a plasma reaction device. In an embodiment of the present invention, the waveform is a half sine waveform, though other suitable waveforms include a half cosine waveform and a Gaussian pulse signal.
A radio frequency (RF) pulse plasma generating system, comprising:
(Amended) A radio frequency (RF) pulse plasma generating system, comprising:
(Amended) A radio frequency (RF) generating system for a plasma reaction device, comprising:
A method for forming a radio frequency (RF) pulse plasma, comprising the steps of:
Dependencies are inferred from the claim text.