Photosensitive resin composition, photosensitive film and process for preparing fluorescent pattern using the same, and phosphor subjected to surface treatment and process for preparing the same

Abstract

Disclosed are a photosensitive resin composition which comprises: (A) a compound having a carboxyl group; (B) a resin having a carboxyl group; (C) a photopolymerizable unsaturated compound having an ethylenic unsaturated group; (D) a photopolymerization initiator which produces free radical by irradiation of active light; and (E) a phosphor, a photosensitive film and a process for preparing a fluorescent pattern using the same, and a phosphor subjected to surface treatment and a process for preparing the same.

Dependencies are inferred from the claim text.