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US 5,858,475 AGranted
Acoustic wave enhanced spin coating method
AssigneeTaiwan Semiconductor Manufacturing Company, Ltd.
InventorWei-Kay Chiu
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Abstract
A method is disclosed to improve the planarization of a coating upon a substrate, in particular to improve the planarization of a photoresist or spin-on-glass coating upon a semiconductor wafer. This is achieved by coupling an ultrasonic wave generator to either the chuck or the spindle of the chuck. Ultrasonic waves emanating from the ultrasonic generator are induced into the coating, vibrating it. The vibration causes coating material to fill in the valleys of the coating, thus planarizing the surface of the coating.
Claims7
A method of providing acoustic power to a spin coater, comprising:
- placing a substrate on a rotatable chuck;
- dispersing a coating upon a substrate, said substrate mounted on said rotatable chuck;
- applying an ultrasonic wave to said substrate, while said chuck is rotating;
- planarizing a top surface of said coating through agitation by said ultrasonic wave;
- and
- planarizing said top surface of said coating through rotation of said chuck.
3 more elements
Dependencies are inferred from the claim text.