Method of and apparatus for washing a substrate
AssigneeDainippon Screen Mfg. Co., Ltd.
InventorsTakamasa Sakai, Sadao Hirae, Minobu Matsunaga
Life of this patent
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Abstract
A substrate washing apparatus includes a cooling system for cooling a substrate to below zero, a wet gas supplying system for supplying a gas containing atomized water to the surface of the substrate cooled by the cooling means to form ice on the surface of said substrate, and an ice removing unit for removing the ice formed on the surface of the substrate. This apparatus removes not only relatively large particles but also fine particles from the substrate.
Claims20
An apparatus for cleaning a substrate, comprising:
- cooling means for cooling said substrate to below zero;
- wet gas supply means for supplying a gas containing atomized water to the surface of said substrate cooled by the cooling means to form ice on the surface of said substrate;
- and
- ice removing means for removing the ice in a solid form, said ice having formed on the surface of said substrate.
An apparatus for cleaning a substrate, comprising:
- cooling means for cooling said substrate to below zero in an enclosure;
- wet gas supply means for supplying a gas containing atomized water to the surface of said substrate cooled by the cooling means to form ice on the surface of said substrate;
- and
- ice removing means provided outside of said enclosure for removing the ice formed on the surface of said substrate.
An apparatus for cleaning a substrate, comprising:
- cooling means for cooling said substrate to below zero;
- wet gas supply means for supplying a gas containing atomized water to the surface of said substrate cooled by the cooling means to form ice on the surface of said substrate;
- ice removing means for removing the ice formed on the surface of said substrate;
- and
- a transferring unit for transferring said substrate from the cooling means to the ice removing means.
Dependencies are inferred from the claim text.