Photosensitive material processing apparatus

A photosensitive material processing apparatus comprising:

• a processing tank;
• and
• a rack placed in said processing tank including a bottom turn guide and a bottom turn cover mated with said bottom turn guide so as to form a space therebetween, said bottom turn cover including an aperture wherein a bottom surface of said bottom turn cover is tapered toward said aperture;
• wherein a bottom portion of said processing tank has a structure configured to receive a processing solution introduced into the interior of said processing tank through the bottom portion of said processing tank;
• and
• wherein said rack has a structure such that the processing solution introduced from the bottom portion of said processing tank enters the space formed between said bottom turn cover and said bottom turn guide of said rack through said aperture, wherein said solution passes through a jetting opening formed in said bottom turn guide and a processing solution jetting passage formed in a rack plate, and jets from a jetting opening formed in said rack plate toward a transport path for a photosensitive material.