Optical disk which reduces cross erasure of data recorded on lands and grooves

An optical disk, comprising:

• a land formed on a surface of the optical disk having a width (Wl) between 0.4 .mu.m-1.0 .mu.m;
• a groove formed on the surface of the optical disk having a width (Wg) between 0.4 .mu.m-1.0 .mu.m;
• and
• a recording film coating said land and said groove,
• wherein a level (d2) from a top of the recording film on said land to a top of the recording film on said groove is between 100 nm-800 nm.

An optical disk, comprising:

• a land formed on the surface of the optical disk having a width (Wl) between 0.4 .mu.m-1.0 .mu.m;
• a groove formed on the surface of the optical disk having a width (Wg) between 0.4 .mu.m-1.0 .mu.m;
• and
• a recording film coating said land and said groove,
• wherein a level (d2) from a top of the recording film on said land to a top of the recording film on said groove is between 100 nm-800 nm, recording film thickness coating said land is denoted by (a), recording film thickness coating said groove is denoted by (b), recording film thickness coating the sidewall surfaces of each land is denoted by (c), a ratio (b/a) is between 0.6-1.1, and a ratio (c/a) is between 0-0.8.

An optical disk, comprising:

• a land formed on a surface of the optical disk having a width (Wl) between 0.4 .mu.m-1.0 .mu.m;
• a groove formed on the surface of the optical disk having a width (Wg) between 0.4 .mu.m-1.0 .mu.m;
• and
• a recording film coating said land and said groove,
• wherein a level (d2) from a top of the recording film on said land to a top of the recording film on said groove is between 50 nm-800 nm.

An optical disk, comprising:

• a land formed on the surface of the optical disk having a width (Wl) between 0.4 .mu.m-1.0 .mu.m;
• a groove formed on the surface of the optical disk having a width (Wg) between 0.4 .mu.m-1.0 .mu.m;
• and
• a recording film coating said land and said groove,
• wherein a level (d2) from a top of the recording film on said land to a top of the recording film on said groove is between 50 nm-800 nm, recording film thickness coating said land is denoted by (a), recording film thickness coating said groove is denoted by (b), recording film thickness coating the sidewall surfaces of each land is denoted by (c), a ratio (b/a) is between 0.6-1.1, and a ratio (c/a) is between 0-0.8.