Water-removing exhaust system for an ion implanter and a method for using the same
AssigneeSamsung Electronic Co., Ltd.
InventorsByeong Ki Rheem, Sang Guen Oh
Life of this patent
Estimating the term…
Abstract
An exhaust system of an ion implanter that eliminates moisture in the process stream comprises: an exhaust pump positioned within the ion implanter; a main exhaust duct positioned outside the ion implanter; an exhaust line extending between the exhaust pump and the main exhaust duct; a gas introduction unit for introducing a moisture eliminating gas into the exhaust line; and a scrubber for removing a predetermined gas from the process stream. By introducing the moisture-eliminating gas (which is preferably heated nitrogen) into the process stream, moisture contained therein is removed from the stream, and the events described hereinabove that produce a corona discharge within the exhaust line are prevented.
Claims12
An exhaust system of an ion implanter used for implanting impurity ions on a surface of a semiconductor wafer, comprising:
- an exhaust pump positioned within the ion implanter;
- a main exhaust duct positioned outside the ion implanter;
- an exhaust line extending between said exhaust pump and said main exhaust duct;
- a gas introduction unit for introducing a moisture eliminating gas to said exhaust line;
- and
- a scrubber for removing a predetermined gas from a process gas in said exhaust line.
A method using an exhaust system for exhausting process gasses from an ion implanter used for implanting impurity ions on a surface of a semiconductor wafer, the exhaust system having an exhaust pump, a main exhaust duct disposed outside the ion implanter, an exhaust line disposed between the exhaust pump and the main exhaust duct, a gas introducing line for introducing a moisture eliminating gas into the exhaust line, and a scrubber for eliminating a specific gas contained in a process gas exhausted from a process chamber to the exhaust line, said method comprising the steps of:
- introducing a moisture eliminating gas into the exhaust line;
- exhausting the process gas from the process chamber to the exhaust line;
- and
- eliminating the specific gas from the process gas flowing through the exhaust line;
- and
- exhausting the remainder of the process gas through the main exhaust duct.
Dependencies are inferred from the claim text.