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US 5,856,101 AGranted
Computer-aided engineering system for design of sequence arrays and lithographic masks
AssigneeAffymetrix, Inc.
InventorsEarl A. Hubbell, MacDonald S. Morris, James L. Winkler
Life of this patent
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Abstract
An improved set of computer tools for forming arrays. According to one aspect of the invention, a computer system (100) is used to select probes and design the layout of an array of DNA or other polymers with certain beneficial characteristics. According to another aspect of the invention, a computer system uses chip design files (104) to design and/or generate lithographic masks (110).
Claims16
A method of forming a lithographic mask comprising the steps of:
- inputting to a computer a sequence of monomer addition steps;
- generating a lithographic mask definition file using said sequence of monomer addition steps, said mask definition file defining a plurality of lithographic reticles on a single mask, each of said plurality of lithographic reticles defining areas of monomer addition for at least one of said monomer addition steps;
- and
- with a computer-controlled system, forming said lithographic mask using said mask definition file.
1 more element
In a computer system, a method of forming a lithographic mask, the method comprising the steps of:
- inputting a plurality of rectangular locations where two or more rectangular locations specify rectangular openings, each rectangular opening corresponding to a flash location where light will shine through to a substrate;
- identifying a first rectangular location specifying a rectangular opening;
- evaluating a second rectangular location adjacent to the first location to determine if the second rectangular location specifies a rectangular opening and, if the second rectangular opening specifies a rectangular opening, connecting the first and second rectangular locations to form a joined rectangular opening;
- and
- outputting a mask design file for forming the lithographic mask, the mask design file specifying at least one joined rectangular opening.
2 more elements
Dependencies are inferred from the claim text.