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US 5,856,071 AGranted
Resist material including si-containing resist having acid removable group combined with photo-acid generator
AssigneeFujitsu Limited
InventorsAkiko Kotachi, Satoshi Takechi
Life of this patent
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Abstract
A fine pattern is formed using a resist material including a copolymer of a silicon-containing acrylate and an acrylate which contains a group that is eliminated by an acid, and a photo-acid generator which generates the acid upon irradiation. The polarity of the material changes after elimination of this group and becomes soluble in an aqueous alkali solution.
Claims6
A process for forming a pattern comprising:
- coating a resist material comprising a copolymer represented by the following formula I and a photo-acid generator, ##STR20## wherein each of R.sub.1 and R.sub.3 independently represents a hydrogen, C.sub.1 -C.sub.4 alkyl, halogen, halogenated (C.sub.1 -C.sub.4) alkyl, nitrile or phenyl, R.sub.2 is a group represented by the following formula II, ##STR21## wherein R.sub.5 is a C.sub.1 -C.sub.4 alkylene, and each of R.sub.6, R.sub.7 and R.sub.8 independently represents a C.sub.1 -C.sub.4 alkyl, halogenated (C.sub.1 -C.sub.4) alkyl, phenyl or tri(C.sub.1 -C.sub.4)alkylsilyl(C.sub.1 -C.sub.4) alkyl, R.sub.4 is a group which is eliminated by an acid, and each of m and n is a positive integer to a substrate to form a resist layer;
- irradiating said resist layer;
- baking said resist layer so irradiated;
- and
- developing said baked resist layer.
2 more elements
A resist material comprising a copolymer and a photo-acid generator, said copolymer being represented by the following formula I:
- ##STR22## wherein each of R.sub.1 and R.sub.3 independently represents hydrogen, a C.sub.1 -C.sub.4 alkyl group, a halogen group, a halogenated C.sub.1 -C.sub.4 alkyl group, a nitrile group or a phenyl group;
- wherein R.sub.2 is a group represented by the following formula II:
- ##STR23## wherein R.sub.5 is a C.sub.1 -C.sub.4 alkylene group, and each of R.sub.6, R.sub.7 and R.sub.8 independently represents a C.sub.1 -C.sub.4 alkyl group, a halogenated C.sub.1 -C.sub.4 alkyl group, a phenyl group or a trialkylsilylalkyl group in which each said alkyl substituent is a C.sub.1 -C.sub.4 alkyl group;
- wherein R.sub.4 is a group which is eliminated by the acid generated by the photo-acid generator;
- wherein each of m and n is a positive integer;
- and
- wherein the elimination of the R.sub.4 group by the acid converts polarity of the material, rendering the material soluble in an aqueous alkali solution.
4 more elements
Dependencies are inferred from the claim text.