Photosensitive resin composition

The photosensitive resin composition which consists essentially of (A) a polyamic acid having at least a recurring unit represented by the formula (I):

• ##STR14## wherein R.sup.1 represents ##STR15## and R.sup.2 represents a divalent organic group, wherein the polyamic acid includes a reaction product of an acid component comprising oxydiphthalic acid or oxydiphthalic anhydride with a diamine containing a diaminopolysiloxane, and, optionally, the polyamic acid having at least one other recurring unit which is a reaction product of said diamine with at least one other tetracarboxylic dianhydride;
• said at least one other tetracarboxylic dianhydride being a compound represented by the formula (II):
• ##STR16## wherein R.sup.3 and R.sup.4 may be the same or different from each other and each represent a monovalent hydrocarbon group;
• and s is an integer of 1 to 5;
• and when s is 2 or more, respective R.sup.3 s or R.sup.4 s may be the same or different from each other, and the diamine containing a diaminopolysiloxane is represented by the formula (III):
• ##STR17## wherein R.sup.5 and R.sup.6 each represent a divalent hydrocarbon group having 1 to 3 carbon atoms, R.sup.7 and R.sup.8 each represent a monovalent hydrocarbon group having 1 to 3 carbon atoms, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 each may be the same or different, and t represents an integer of 1 to 5;
• (B) an acryl compound having an amino group, (C) a photoinitiator and (E) an azide compound having two azido groups.

A photosensitive resin composition which comprises (A) a polyamic acid having at least a recurring unit represented by the formula (I):

• ##STR18## wherein R.sup.1 represents ##STR19## and R.sup.2 represents a divalent organic group, wherein the polyamic acid includes a reaction product of an acid component comprising oxydiphthalic acid or oxydiphthalic anhydride with a diamine, and wherein the diamine contains a diaminopolysiloxane represented by the formula (III):
• ##STR20## wherein R.sup.5 and R.sup.6 each represent a divalent hydrocarbon group, R.sup.7 and R.sup.8 each represent a monovalent hydrocarbon group, R.sup.5, R.sup.6, R.sup.7 and R.sup.8 each may be the same or different, and t represents an integer of 1 to 5, and, optionally, the polyamic acid having at least one other recurring unit which is a reaction product of said diamine with at least one other tetracarboxylic dianhydride;
• (B) an acryl compound having an amino group;
• and
• (C) a photoinitiator for an i-line stepper,
• wherein the composition transmits light of the i-line stepper.

A photosensitive resin composition which comprises (A) a polyamic acid having at least a recurring unit represented by the formula (I):

• ##STR21## wherein R.sup.1 represents ##STR22## and R.sup.2 represents a divalent organic group, wherein the polyamic acid includes a reaction product of an acid component comprising oxydiphthalic acid or oxydiphthalic anhydride with a diamine, and wherein the diamine contains a diaminopolysiloxane represented by the formula (III):
• ##STR23## wherein R.sup.5 and R.sup.6 each represent a divalent hydrocarbon group, R.sup.7 and R.sup.8 each represent a monovalent hydrocarbon group, R.sup.5 and R.sup.6, R.sup.7 and R.sup.8 each may be the same or different, and t represents an integer of 1 to 5, and, optionally, the polyamic acid having at least one other recurring unit represented by a formula IV:
• ##STR24## wherein R.sup.1 has been defined previously, and R.sup.9 is selected from the group consisting of ##STR25## (B) an acryl compound having an amino group;
• and (C) a photoinitiator for an i-line stepper, wherein the composition transmits light of the i-line stepper.