Topcoating composition and film-forming process by use of the same

A film-forming process which comprises (a) coating the process topcoating composition onto a substrate to form a film, said topcoating composition having been prepared by incorporating condensate of an organosilicate represented by the formula:

• ##STR6## wherein the Rs are the same or different and each R is hydrogen atom or a monovalent hydrocarbon group having to 1 to 10 carbon atoms, into an organic solvent-based organic coating composition, the condensate having a degree of condensation of 2 to 10, and an amount of the organosilicate in topcoating composition is in the range of 0.1 to 50 parts by weight per 100 parts by weight of the resin solid content in the organic coating composition, and (b) treating the surface of said topcoating composition coating on the film with an acid, said surface showing a contact angle to water in the range of 20 to 65 degrees.