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US 5,855,716 AGranted
Parallel contact patterning using nanochannel glass
AssigneeThe United States of America as represented by the Secretary of the Navy
InventorsRonald J. Tonucci, Douglas H. Pearson
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Abstract
The present invention is a method for modifying a substrate in a predetermined pattern, comprising the steps of: (a) applying a material to the face of an etched nanochannel glass (NCG), where this face has a pattern of channels corresponding to the predetermined pattern, and (b) contacting the substrate with the etched NCG face having applied material, under conditions for transferring the material to the substrate.
Claims21
A method for modifying a substrate in a predetermined pattern, comprising the steps of:
- providing a sample of etched nanochannel glass (NCG), said etched NGC having a predetermined pattern disposed upon a face thereof;
- applying a material to said patterned face;
- providing a substrate to which material coated on said patterned NCG is to be transferred;
- contacting said material coated patterned face of etched NCG with a face of said substrate;
- and
- providing conditions under which material coating on said patterned NCG is transferred and adhered to said substrate face.
3 more elements
Dependencies are inferred from the claim text.