Ion beam machining method and device thereof
AssigneeSeiko Instruments Inc.
InventorKazuo Aita
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AssigneeSeiko Instruments Inc.
InventorKazuo Aita
Estimating the term…
To carry out machining by a focused ion beam using an assist gas including steam gas. In a machining operation by a focused ion beam by using an assist gas including steam gas, as a method of supplying steam gas, the steam gas is supplied from salt hydrate and the pressure of steam is controlled by controlling the temperature of the salt hydrate. As a method for supplying steam gas, when the steam gas is introduced into a vacuum chamber, the flow rate needs to be controlled by a control valve since the vapor pressure of water is very high, which amounts to a complicated gas supply system and which amounts to an expensive device. However, steam vapor having a low pressure is supplied by using salt hydrate, the introduction of gas to a vacuum chamber is made feasible only by passing the gas through a friction pipe and the amount of introducing a gas can be controlled by a simple system where only the temperature of the salt hydrate is controlled by an inexpensive temperature controller.
A focused ion beam machining device in which ions generated from an ion source are clustered into a focused ion beam by an ion lens system in a vacuum tank exhausted by a vacuum pump, the focused ion beam is irradiated by scanning on a predetermined region of a surface of a sample where a thin film is formed on a surface of a matrix thereof by a scanning electrode, secondary particles emitted from the sample are detected by a detector, signals from the detector are supplied to a display device via an A/D converter thereby imaging the sample and an ion beam machining is conducted with respect to the predetermined region based on a result of imaging;
A focused ion beam machining method for correcting a film pattern formed on a substrate comprising:
Dependencies are inferred from the claim text.