Plasma-etching electrode plate
AssigneeTokai Carbon Co., Ltd.
InventorsOsamu Machida, Hisayuki Hamajima
Life of this patent
Estimating the term…
Abstract
A plasma-etching electrode plate in the form of flat glassy carbon plate is characterized by a flatness with a warp smaller than 0.3 mm. This flatness permits the electrode plate to have a uniform surface temperature distribution which contributes to uniform etching on semiconductor wafers. The electrode plate is a glassy carbon plate obtained from one or more thermosetting resins having a carbon yield higher than 20%.
Claims7
A plasma-etching electrode plate in the form of flat glassy carbon plate which is characterized by flatness with a warp smaller than 0.3 mm.
A plasma-etching apparatus comprising an upper electrode plate and a lower electrode plate provided in face-to-face parallel relationship with respect to each other and means for applying a high-frequency electric power across the electrode plates, wherein an improvement comprises the upper electrode plate being a glassy carbon plate having a flatness with a warp less than 0.3 mm.
Dependencies are inferred from the claim text.