Multi-cathode electron beam plasma etcher

A multi-cathode electron beam plasma etcher comprising:

• a vacuum chamber;
• several cathodes which are installed in the upper end of the upper part of the chamber and generates an electron beam in order to generate plasma in a large area;
• an acceleration electrode and a deceleration electrode which form an acceleration and a deceleration tube structure in order to extract much electron beam and are arranged sequentially from the front of the cathode and form an electrostatic lens when a differential voltage is applied respectively;
• first vacuum evacuation means to make the upper part of said chamber vacuum;
• an etching gas injection means which is installed in the side wall around the upper end of the lower part of said chamber;
• second vacuum evacuation means which is installed in the lower part of said chamber;
• and
• a holder of the etched body which is installed in the lower part of said chamber;
• wherein a lens is included additionally in the inside of the chamber between the deceleration electrode and the etching gas injection means in order to control the dispersion and distribution of the electron beam, condense the electron beam and then, diffuse the electron beam.