Ion source generator auxiliary device for phosphorus and arsenic beams
AssigneeImplant Sciences Corporation
InventorAnthony J. Armini
Life of this patent
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Abstract
The present invention comprises an ion source apparatus for producing an ion beam from a solid material of arsenic or phosphorus. The ion source includes a plasma chamber having an inlet orifice and an outlet orifice wherein a non-toxic carrier gas is inputted into the plasma chamber. A means for generating a gas plasma is arranged within the plasma chamber and an electrically insulated platform is also arranged within the plasma chamber. A heatable wafer of solid source material of a metal phosphide or arsenide is attached to the platform, for conversion upon heating, into an ion beam.
Claims14
An ion source apparatus for producing an ion beam from a solid material comprising:
- a plasma chamber having an inlet orifice and an outlet orifice;
- a carrier gas input into said plasma chamber through said inlet orifice;
- an electrically insulated platform arranged within said plasma chamber;
- a wafer of solid source material attached to said platform;
- a means for generating a gas plasma within said plasma chamber;
- and
- a means for heating said wafer of solid source material in said gas plasma, to permit the generation of an ion beam in said plasma, for subsequent discharge through said outlet orifice.
A method of generating an ion beam from a solid source within a plasma chamber, comprising the steps of:
- introducing said solid source material into said plasma chamber;
- introducing a carrier gas into said plasma chamber;
- generating a gas plasma within said plasma chamber;
- heating said solid source material within said chamber so as to evaporate a portion thereof into said gas plasma;
- and
- extracting an ion beam from an exit orifice in said plasma chamber.
Dependencies are inferred from the claim text.