Heating system, vacuum process chamber comprising such a heating system and operation of such a vacuum process chamber

A vacuum process chamber having a heating system, comprising heating circuit with a heating electrode, and a transformer transmitter for generating, on a secondary side thereof, a heating current in the heating current circuit looped between adjacent current connections, wherein the heating electrode, comprises a process electrode for an electrode-supported process in a process chamber, and the heating current circuit is connected by a process-electrode operating source to an electric operating potential, and wherein the operating source and a shielding between primary and secondary windings of the transformer transmitter, are connected to a reference potential.

A process for operating a plasma process chamber with a heating current circuit including a heating electrode, and a heating system for a vacuum process chamber having a transformer transmitter for generating, on a secondary side thereof, a heating current in the heating current circuit looped between adjacent current connections, the vacuum process chamber is a plasma process chamber and the heating electrode constitutes the electrode for forming plasma discharge in the chamber, comprising the steps of coating the electrode in a process-compatible manner, and connecting the heating current circuit by a process-electrode operating source to an electrode operating potential, connecting the operating source and a shielding between primary and secondary windings of the transformer transmitter to a reference potential, and guiding the heating current in the heating current circuit to dampen process-caused, time-related temperature jumps on the electrode.

A heating system for a vacuum process comprising:

• a heating electrode with a coaxial conductor arrangement on which coaxial conductors are conductively connected at one end thereof;
• a transformer transmitter with a primary wind and a secondary winding, the secondary winding being connected to said coaxial conductors at another end thereof and forming with said coaxial conductors a heating current loop arrangement;
• and a connection tap provided at said current loop arrangement distant from said one end whereat said coaxial conductors are conductively connected for applying a desired electric potential to said current loop arrangement.

A vacuum process chamber having a heating system, comprising a heating electrode with a coaxial conductor arrangement extending into said vacuum chamber on which coaxial conductors are conductively connected at one end of said arrangement;

• a transformer transmitter with a primary winding and a secondary winding, the secondary winding being connected to said coaxial conductors at another end of said arrangement and forming with said coaxial conductors a heating current loop arrangement;
• and a tap provided at said current loop arrangement distant from said one end for applying a desired electric potential to said loop arrangement.

A plasma process within a plasma treatment chamber having surfaces exposed to a plasma discharge being solid material coated and a heater electrode exposed to said plasma discharge, comprising the steps of controlling heating of said electrode so as to dampen rapid temperature variations at said electrode and caused by said plasma process so as to prevent solid material deposited on said heater electrode from flaking off .