Antipsychotic agents, composition and method of use
AssigneeHoechst-Roussel Pharmaceuticals Inc.
InventorsMark G. Palermo, Lawrence L. Martin, Peter A. Nemoto
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Abstract
This invention relates to compounds of the formula ##STR1## wherein X, Y, Z, m, n and p are as defined within, pharmaceutical compositions containing these compounds and to their use as antipsychotic agents, particularly in the treatment of schizophrenia. Depot derivatives of the compounds are useful for providing long acting effects of the compounds.
Claims21
A compound of the formula ##STR21## wherein X is --OH, --OC(.dbd.O)(C.sub.1 -C.sub.18)alkyl, --OC(.dbd.O)(C.sub.6 -C.sub.10)aryl, --OC(.dbd.O)(C.sub.1 -C.sub.12)alkyl(C.sub.6 -C.sub.10)aryl, --OC(.dbd.O)NH(C.sub.1 -C.sub.18)alkyl, --OC(.dbd.O)(C.sub.1 -C.sub.12)alkyl(C.sub.3 -C.sub.8)cycloalkyl, --OC(.dbd.O)O(C.sub.1 -C.sub.18)alkyl, or --OC(.dbd.O)--(C.sub.3 -C.sub.12)cycloalkyl;
- Y is H, halogen, trifluoromethyl, (C.sub.1 -C.sub.6)alkoxy, cyano or nitro;
- Z is O;
- m is 1,2,3 or 4;
- n is 1;
- and
- p is 1 or 2;
- and its pharmaceutically acceptable acid addition salts.
Dependencies are inferred from the claim text.