Measurement system and measurement method

A measurement method comprising the steps of:

• irradiating a dielectric film with light including wavelength of an infrared region;
• and
• measuring a potential difference of the dielectric film charged with plasma on the basis of change in absorbance of the light within absorption wavelength range intrinsic to the dielectric film, among the light absorbed by the dielectric film.

A measurement method comprising the steps of:

• preparing a current detection electrode in an interior portion of a plasma treatment chamber for performing plasma treatment in such a manner that an distal end of the electrode is exposed in a transmission hole in an insulation member, the current detection electrode being charged with a negative voltage to the plasma treatment chamber;
• and
• measuring a contamination amount in the plasma treatment chamber on the basis of current detected by the detection electrode while deposition of a material present in the plasma treatment chamber on the current detection electrode is being prevented by inserting the current detection electrode into the transmission hole formed of the insulation member.

A measurement system comprising:

• light radiation means for irradiating a treatment substrate with light including wavelength of an infrared region;
• temperature/film-thickness measurement means for measuring temperature and film-thickness of the treatment substrate simultaneously, the temperature being measured on the basis of change in wavenumber of absorption peak within an absorption wavelength region intrinsic to the treatment substrate, among the light absorbed by the treatment substrate and previously-prepared data regarding temperature dependency of an absorption spectrum with respect to the treatment substrate;
• and the film-thickness being measured on the basis of change in absorbance of light within the absorption wavelength region intrinsic to the treatment substrate and previously-prepared data regarding film-thickness dependency of absorption spectrum with respect to the treatment substrate.

A measurement system comprising:

• light radiation means for irradiating a treatment substrate with light including at least two wavelengths of an infrared region;
• and
• a temperature measurement means for measuring the treatment substrate on the basis of change in absorbance of light containing at least two wavelengths in an absorption wavelength region intrinsic to the treatment substrate, among the light absorbed in the treatment substrate, and on the basis of previously prepared data regarding temperature dependency of absorption spectra of at least two light wavelengths with respect to the treatment substrate.