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US 5,851,727 AGranted
Photosensitive polymers and photoresist compositions containing the same
AssigneeSamsung Electronics Co., Ltd.
InventorsSang-jun Choi, Chun-geun Park, Young-bum Koh
Life of this patent
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Abstract
Photosensitive polymers are represented by the formula: ##STR1## wherein R1 is selected from the group consisting of hydrogen and methyl; R2 is selected from the group consisting of aliphatic hydrocarbon groups having from 6 to 20 carbon atoms; R3 is selected from the group consisting of a t-butyl group and a tetrahydropyranyl group, and m and n are selected such that the ratio m/(n+m) ranges from 0.1 to 0.9. Photoresist compositions comprise the photosensitive polymers and photoacid generators.
Claims24
A photosensitive polymer represented by the formula:
- ##STR12## wherein R.sub.1 is selected from the group consisting of hydrogen and methyl;
- R.sub.2 is selected from the group consisting of aliphatic hydrocarbons having from 6 to 20 carbon atoms;
- R.sub.3 is selected from the group consisting of a t-butyl group and a tetrahydropyranyl group, and m and n are selected such that the ratio m/(n+m) ranges from 0.1 to 0.9.
A photoresist composition comprising:
- a photosensitive polymer represented by the following formula:
- ##STR13## wherein R.sub.1 is selected from the group consisting of hydrogen and methyl;
- R.sub.2 is selected from the group consisting of aliphatic hydrocarbon groups having from 6 to 20 carbon atoms;
- R.sub.3 is selected from the group consisting of a t-butyl group and a tetrahydropyranyl group, and m and n are selected such that the ratio m/(n+m) ranges from 0.1 to 0.9;
- and
- a photoacid generator.
3 more elements
Dependencies are inferred from the claim text.