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US 5,850,467 AGranted
Image data inspecting method and apparatus providing for equal sizing of first and second image data to be compared
AssigneeFujitsu Limited
InventorsShogo Matsui, Kenichi Kobayashi
Life of this patent
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Abstract
An image data inspecting method detects whether or not a pattern described by a first image data and a pattern described by a second image data match. This method includes the steps of (a) carrying out a sizing process on the first and second image data so that the patterns described thereby are at least enlarged or reduced by the same amount, and (b) comparing the first and second image data which are processed in the step (a) to determine whether or not the processed first and second image data match.
Claims8
A image data inspecting method, comprising:
- storing in a memory first image data of a first actual pattern obtained by optically imaging an actual element selected from among a reticle, a mask, a wafer and a chip and second image data of a second pattern comprising a test pattern and obtained from storage;
- sizing, with the aid of an image data processor, the first and second image data by a same amount;
- comparing, using a comparator, the sized first and second image data to determine whether the sized first and second image data match;
- and
- based upon the determination of the comparing step, correspondingly concluding whether the first pattern matches the second pattern wherein:
- the sizing step includes a step of enlarging and a step of reducing the first and second image data;
- and
- the comparing step includes a first step of comparing the enlarged first and second image data and making a first determination whether Or not the enlarged first and second image data match and a second step of comparing the reduced first and second image data and making a second determination of whether or not the reduced first and second image data match;
- and
- the concluding steps based upon the first and second determinations made by the comparing step.
7 more elements
An image data inspecting apparatus, comprising:
- first means for providing first image data of a first actual pattern obtained by optically imaging an actual element from among a reticle, a mask, a wafer and a chip;
- second means for providing second image data of a second pattern comprising a test pattern obtained from storage;
- processing means for sizing the first and second image data by a same amount;
- memory means, coupled to said processing means, for storing the sized first and second image data;
- comparator means, coupled to said memory means, for receiving from the memory means and comparing the sized first and second image data to determine whether the sized first and second image data match;
- and
- output means, coupled to said comparator means, for outputting a determination of said comparator means wherein:
- said processing means sizes the first and second image data by selectively and separately, enlarging the first and second image data by the same amount and reducing the first and second image data by the same amount;
- and
- said comparator means separately and in a first step compares the enlarged first and second image data to make a first determination whether or not the enlarged first and second image data match and, in a second step, compares the reduced first and second image data to make a second determination whether or not the reduced first and second image data match.
7 more elements
Dependencies are inferred from the claim text.