Method of isolation by active transistors with grounded gates

A method for making a portion of a semiconductor device comprising the steps of:

• forming a first insulating layer on a surface of a semiconductor substrate;
• forming a first polycrystalline silicon layer on said first insulating layer;
• forming a covering layer on said polycrystalline silicon layer;
• selectively etching away portions of said covering layer and underlying portions of said first polycrystalline silicon layer;
• forming a first set of insulating sidewall spacers on remaining portions of said covering layer and underlying remaining portions of said first polycrystalline silicon layer, leaving an exposed portion of said first insulating layer;
• etching away said exposed portion of said first insulating layer, leaving exposed active areas of said semiconductor substrate;
• forming a second insulating layer on said active areas of said semiconductor substrate;
• forming a second polycrystalline silicon layer on said second insulating layer;
• forming a metal silicide layer on said second polycrystalline silicon layer;
• selectively etching away portions of said metal silicide layer, underlying portions of said second polycrystalline silicon layer and underlying portions of said second insulating layer;
• forming lightly doped drain and source extensions;
• forming a second set of insulating sidewall spacers on remaining portions of said metal silicide layer, underlying remaining portions of said second polycrystalline silicon layer and underlying remaining portions of said second insulating layer;
• forming heavily doped drain and source regions;
• electrically connecting said first polycrystalline silicon layer to said semiconductor substratewith an ohmic connection;
• electrically connecting one or more of said source regions to said semiconductor substrate;
• and
• connecting said first polycrystalline silicon layer to an electric potential selected to prevent current flow between said active areas.

A method for making a portion of a semiconductor device comprising the steps of:

• forming a first insulating layer on a surface of a semiconductor substrate;
• forming a first polycrystalline silicon layer on said first insulating layer;
• forming a covering layer on said polycrystalline silicon layer;
• selectively etching away portions of said covering layer and underlying portions of said first polycrystalline silicon layer;
• forming a first set of insulating sidewall spacers on remaining portions of said covering layer and underlying remaining portions of said first polycrystalline silicon layer, leaving an exposed portion of said first insulating layer;
• etching away said exposed portion of said first insulating layer, leaving exposed active areas of said semiconductor substrate;
• forming a second insulating layer on said active areas of said semiconductor substrate;
• forming a second polycrystalline silicon layer on said second insulating layer;
• forming a metal silicide layer on said second polycrystalline silicon layer;
• selectively etching away portions of said metal silicide layer, underlying portions of said second polycrystalline silicon layer and underlying portions of said second insulating layer;
• forming lightly doped drain and source extensions;
• forming a second set of insulating sidewall spacers on remaining portions of said metal silicide layer, underlying remaining portions of said second polycrystalline silicon layer and underlying remaining portions of said second insulating layer;
• forming heavily doped drain and source regions;
• electrically connecting said first polycrystalline silicon layer to said semiconductor substrate with an ohmic connection;
• electrically connecting one or more of said drain regions to said semiconductor substrate;
• and
• connecting said first polycrystalline silicon layer to an electric potential selected to prevent current flow between said active areas.

A method for making a memory array portion and peripheral circuit portion of a semiconductor device, comprising the steps of:

• forming a blanket nitride mask layer over a memory portion of a semiconductor substrate;
• forming a peripheral nitride mask layer over a peripheral portion of said semiconductor substrate;
• selectively etching said peripheral nitride mask layer, leaving exposed regions of said peripheral portion of said semiconductor substrate;
• growing a field oxide on said exposed regions of said peripheral portion of said semiconductor substrate;
• removing said blanket nitride mask layer and remaining portions of said peripheral nitride mask layer;
• forming an insulating layer on said memory portion of said semiconductor substrate;
• forming a polycrystalline silicon layer on said insulating layer;
• forming a covering layer on said polycrystalline silicon layer;
• selectively etching away portions of said covering layer and underlying portions of said polycrystalline silicon layer;
• forming insulating sidewall spacers on remaining portions of said covering layer and underlying remaining portions of said polycrystalline silicon layer, leaving an exposed portion of said insulating layer;
• etching away said exposed portion of said insulating layer, leaving exposed for further processing active areas of said memory portion of said semiconductor substrate;
• electrically connecting said polycrystalline silicon layer to said semiconductor substrate with an ohmic connection;
• and
• connecting said polycrystalline silicon layer to an electric potential selected to prevent current flow between said active areas.