Resin composition for stereolithography
AssigneeTeijin Seiki Co., Ltd.
InventorsTsuneo Hagiwara, Yorikazu Tamura
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Abstract
A resin composition for stereolithography and a process for producing a three-dimensional object using the same. The resin composition comprises (1) a liquid photohardenable resin composition containing at least one of photo-polymerizable compounds and a photosensitive polymerization initiator, and (2) at least one of radiation energy absorbers in an amount of from 0.001 to 1.0% by weight based on the total amount of the liquid photohardenable resin composition (1).
Claims3
A resin composition for stereolithography comprising (1) a liquid photohardenable resin composition comprising an epoxy photohardenable resin composition and a monofunctional or polyfunctional (meth)acrylate monomer, at least one photo-polymerizable compound selected from the group consisting of aliphatic diepoxy compounds, alicyclic diepoxy compounds and aromatic diepoxy compounds, and a photo-initiator for polymerization, and (2) at least one radiation energy absorber in an amount of from 0.001 to 1.0% by weight based on the total amount of said liquid photohardenable resin composition (1), wherein said at least one radiation energy absorber (2) has an absorbance in a wavelength region of from 300 to 350 nm of at least 0.1 when measuring a solution obtained by dissolving 1 mg of said at least one radiation energy absorber in 100 ml of ethanol which is placed in a quartz cell having a light path length of 10 mm and said at least one radiation energy absorber (2) is selected from the group consisting of:
- (i) a benzotriazole compound represented by the formula (I):
- ##STR6## wherein R.sup.1 and R.sup.2 are independently selected from the group consisting of a hydrogen atom, linear or branched chain substituted or unsubstituted alkyl groups having from 1 to 20 carbon atoms, and substituted or unsubstituted phenyl groups;
- and X is a hydrogen atom or a halogen atom;
- (ii) a benzophenone compound represented by formula (II):
- ##STR7## wherein R.sup.3 and R.sup.4 are independently selected from the group consisting of a hydrogen atom, linear or branched chain substituted or unsubstituted alkyl groups having from 1 to 20 carbon atoms, and substituted or unsubstituted phenyl groups;
- a is 0 or 1;
- and b is 0 or 1;
- (iii) a phenyl salicylate compound is represented by formula (III):
- ##STR8## wherein R.sup.5 is selected from the group consisting of a hydrogen atom, linear or branched chain substituted or unsubstituted alkyl groups having from 1 to 20 carbon atoms, and substituted or unsubstituted phenyl groups;
- and
- (iv) a cyanoacrylate compound represented by formula (IV):
- ##STR9## wherein R.sup.6 and R.sup.7 are independently selected from the group consisting of a hydrogen atom, linear or branched chain substituted or unsubstituted alkyl groups having from 1 to 20 carbon atoms, and substituted or unsubstituted phenyl groups;
- and R.sup.8 is a linear or branched chain alkyl group having from 1 to 20 carbon atoms.
Dependencies are inferred from the claim text.