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AssigneeCanon Kabushiki Kaisha
InventorsJunichiro Hashizume, Shigenori Ueda, Makoto Aoki
Estimating the term…
A light receiving member comprising a electrically conductive substrate, a photoconductive layer composed of a non-single crystalline material containing at least silicon atoms as a matrix formed on said substrate by decomposing a silicon-containing raw material gas, and a surface protective layer composed of a non-single crystalline carbon material containing hydrogen formed on said photoconductive layer by decomposing a raw material gas comprising at least a hydrocarbon using a high frequency power with an oscillation frequency of 50 MHz to 450 MHz, wherein a 20 .ANG. or more thick surface side layer region of said surface protective layer composed of said non-single crystalline carbon material is etched at an etching speed of 0.1 to 50 .ANG./sec. by means of a fluorine-containing plasma produced by decomposing a fluorine-containing gas using a high frequency power with an oscillation frequency of 50 MHz to 450 MHz such that said surface protective layer has a thickness of 100 to 10000 .ANG. and has an etched surface deposited with fluorine atoms so as to cover said etched surface. And a process for producing said light receiving member.
A light receiving member comprising an electrically conductive substrate, a photoconductive layer comprising a non-single crystalline material containing at least silicon atoms as a matrix formed on said substrate by decomposing a silicon-containing raw material gas, and a surface protective layer comprising a non-single crystalline carbon material containing hydrogen atoms formed on said photoconductive layer by decomposing a raw material gas comprising at least a hydrocarbon using a high frequency power with an oscillation frequency of 50 MHz to 450 MHz,
A process for producing a light receiving member, comprising the steps of:
A light receiving member having a surface protective layer constituted by a non-single crystalline carbon material and which has a surface etched in a fluorine-containing gaseous atmosphere by applying a high frequency power with an oscillation frequency of 50 MHz to 450 MHz.
A process for producing a surface protective layer of a light receiving member comprising etching a surface of a non-single crystalline carbon material in a fluorine-containing gaseous atmosphere by applying a high frequency power with an oscillation frequency of 50 MHz to 450 MHz.
Dependencies are inferred from the claim text.