Method for manufacturing a chemically adsorbed film and a chemical adsorbent solution for the method
AssigneeMatsushita Electric Industrial Co., Ltd.
InventorKazufumi Ogawa
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Abstract
The methods of forming a chemically adsorbed film by contacting a substrate with a solution mixture containing an alkoxysilane surface active agent, a non-aqueous solvent and a silanol-condensing catalyst to form a film covalently bonded to the substrate via siloxane bonds. These methods do not generate hydrochloric acid gas in forming the films and allow practical reaction rates.
Claims16
A method of forming a chemically adsorbed film on a substrate having active hydrogen groups on a surface thereof, comprising:
- preparing a solution mixture comprising an alkoxysilane surface active agent, an active hydrogen-free non-aqueous solvent and a silanol-condensing catalyst,
- contacting said substrate with said solution mixture, and
- reacting said alkoxysilane surface active agent and silanol condensing catalyst on the surface of said substrate having active hydrogen groups to form a chemically adsorbed film covalently bonded to the surface of said substrate via a siloxane bond.
A method of forming a chemically adsorbed film on a substrate having active hydrogen groups on a surface thereof, comprising:
- preparing a solution mixture comprising an silane surface active agent, an active hydrogen-free non-aqueous solvent and a silanol-condensing-catalyst,
- contacting said substrate with said solution mixture, and
- reacting said silane surface active agent and silanol condensing catalyst on the surface of said substrate having active hydrogen groups to form a chemically adsorbed film covalently bonded to the surface of said substrate via a siloxane bond,
- wherein said silane surface active agent is at least one selected from the group consisting of hexaalkoxy disiloxane, octaalkoxy trisiloxane, dialkoxysilane, trialkoxysilane and tetraalkoxysilane.
Dependencies are inferred from the claim text.