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US 5,849,071 AGranted
Liquid source formation of thin films using hexamethyl-disilazane
AssigneesSymetrix Corporation, Matsushita Electronics Corporation
InventorsGary F. Derbenwick, Larry D. McMillan, Narayan Solayappan, Michael C. Scott, Carlos A. Paz de Araujo, Shinichiro Hayashi
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Abstract
A precursor liquid comprising several metal 2-ethylhexanoates, such as strontium, tantalum and bismuth 2-ethylhexanoates, in a solvent such as xylenes/methyl ethyl ketone and a small amount of hexamethyl-disilazane. The liquid is dried, baked, and annealed to form a thin film of a layered superlattice material, such as strontium bismuth tantalate, on the substrate.
Claims2
A liquid precursor for forming a metal oxide, said precursor comprising:
- a plurality of metal moieties in effective amounts for forming a layered superlattice material upon application said precursor to a substrate and heating;
- and a solvent comprising hexamethyl-disilazane.
Dependencies are inferred from the claim text.