A method of manufacturing a surface emission type semiconductor laser having an optical detector, wherein a surface emission type semiconductor laser is formed on a first region of a semiconductor substrate, and at least one photodiode is formed on a second region of said semiconductor substrate, comprising the steps of:
- (a) successively epitaxially growing on each of said first and second regions a first conducting semiconductor layer, a second conducting semiconductor layer having a thickness of at least 1 .mu.m, a pair of reflecting mirrors and a multilayer semiconductor layer formed therebetween;
- (b) etching one of said pair of reflecting mirrors being on the light emitting side to form a pillar portion on said first region of said epitaxial growth layers;
- (c) forming an insulating layer in the periphery of said pillar portion;
- (d) forming an upper electrode having an opening formed therein at the end surface of said pillar portion;
- and
- (e) etching said epitaxial growth layer in said second region, said etching step is terminated leaving a part of said second conducting semiconductor layer so that said second conducting semiconductor layer on said second region has a thickness of less than 1 .mu.m.