Photoelectric conversion apparatus having a light-shielding shunt line and a light-shielding dummy line
AssigneeNikon Corporation
InventorTadao Isogai
Life of this patent
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Abstract
Photoelectric conversion elements, each of which comprises a field effect transistor, are arranged in a two-dimensional matrix. The drain regions of the field effect transistors are continuously formed like a mesh so as to be commonly connected together in the row and column directions. Light-shielding drain shunt lines commonly connecting the drain regions of the field effect transistors along the column direction are formed at a rate of 1 line to a plurality of columns. Electrically floating light-shielding dummy lines having no connection to the drain regions of the field effect transistors are formed in the columns where no drain shunt lines are formed. Thus, high yield in manufacture is attained, while sensitivity is prevented from fluctuating.
Claims6
A photoelectric conversion apparatus comprising:
- a plurality of photoelectric conversion elements arranged in a two-dimensional matrix defined by a row direction and a column direction, each of said photoelectric conversion elements comprising:
- a photoelectric conversion portion for generating and storing a charge corresponding to an intensity of light received thereby, and
- an amplifying portion having a control region, said amplifying portion outputting a signal corresponding to the charge received from said photoelectric conversion portion at said control region;
- a light-shielding shunt line commonly connecting the amplifying portions along the column direction, one shunt line being formed for a plurality of columns;
- and
- a light-shielding dummy line being electrically floating without connecting with said amplifying portions, said dummy line being formed in a column line being free of said shunt line.
Dependencies are inferred from the claim text.