US 5,846,883 AGranted

Method for multi-zone high-density inductively-coupled plasma generation

AssigneeCVC, Inc.

InventorMehrdad M. Moslehi

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Abstract

A multi-zone high-density inductively-coupled plasma source includes a first individually controlled RF antenna segment for producing a plasma from a process gas. A second individually controlled coil segment is included in the ICP source for producing a plasma from a process gas. In various embodiments, more than two sets of individually controlled coil segments may be used. In one embodiment, a separate power supply may be used for each coil segment individually. Another aspect of this invention is a hermetically-sealed inductively-coupled plasma source structure and method of fabrication which eliminates the possibility of process contamination, improves the source hardware reliability and functionality, and improves the vacuum integrity and ultimate base pressure of the plasma system.

Claims27

Dependent claims

A method for producing a plasma in a plasma processing equipment having a plasma processing chamber, comprising the steps of:

producing a plasma from a plasma process gas using a first inductively-coupled antenna structure and at least one additional inductively-coupled antenna structure, wherein said first antenna structure and said at least one additional antenna structure substantially overlap a cross-section volume of said plasma, wherein said first antenna structure and said at least one additional antenna structure are contained within said plasma processing chamber;
supplying said plasma process gas from an array of showerhead injection holes distributed such that all of said plasma processing gas is acted upon by all said antenna structures immediately upon exiting said showerhead injection holes,
providing power to said first inductively-coupled antenna structure from a first power source;
and
providing power to said at least one additional inductively-coupled antenna structure from at least one additional power source to establish a substantially uniform plasma process on at least one substrate in said plasma processing equipment.

2 more elements

A method for forming a multi-zone high-density inductively-coupled plasma source, comprising the steps of:

utlizing a first set of inductively-coupled antenna coil segments for producing a plasma from a plasma process gas;
utilizing at least one separate set of inductively-coupled antenna coil segments for separately producing a plasma from a plasma process gas wherein said plasma process gas is supplied from an array of showerhead injection holes distributed such that all of said plasma processing gas is acted upon by all said antenna coil segments immediately upon exiting said showerhead injection holes;
operating said first set of inductively-coupled coil antenna segments and said at least one separate set of inductively-coupled antenna coil segments together to establish a substantially uniform plasma process;
positioning said first set of inductively-coupled antenna coil segments and said at least one separate set of inductively-coupled antenna coil segments so that both antenna structures substantially overlap the cross-section volume of said plasma;
and
generating said plasma in a single plasma region within said processing chamber.

3 more elements

Dependencies are inferred from the claim text.